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Electrical Properties of Unintentionally Doped Semi-Insulating and Conducting 6H-SiC

机译:无意掺杂的半绝缘和导电6H-SiC的电性能

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摘要

Temperature dependent Hall effect (TDH), low temperature photoluminescence (LTPL), secondary ion mass spectrometry (SIMS), optical admittance spectroscopy (OAS), and thermally stimulated current (TSC) measurements have been made on 6H-SiC grown by the physical vapor transport technique without intentional doping. n- and p-type as well semi-insulating samples were studied to explore the compensation mechanism in semi-insulating high purity SiC. Nitrogen and boron were found from TDH and SIMS measurements to be the dominant impurities that must be compensated to produce semi-insulating properties. The electrical activation energy of the semi-insulating sample determined from the dependence of the resistivity was 1.0 eV. LTPL lines near 1.00 and 1.34 eV, identified with the defects designated as UD-1 and UD-3, were observed in all three samples but the intensity of the UD-1 line was almost a factor of 10 more in the n-type sample than in the the p-type sample with that in the semi-insulating sample being intermediate between those two. OAS and TSC experiments confirmed the high purity of this material. The results suggest that the relative concentrations of a dominant deep level and nitrogen and boron impurities can explain the electrical properties in this material.
机译:已对由物理蒸气生长的6H-SiC进行了温度依赖性霍尔效应(TDH),低温光致发光(LTPL),二次离子质谱(SIMS),光导谱(OAS)和热激发电流(TSC)测量没有故意掺杂的传输技术。研究了n型和p型以及半绝缘样品,以探索半绝缘高纯度SiC的补偿机理。从TDH和SIMS测量中发现氮和硼是主要杂质,必须补偿这些杂质才能产生半绝缘性能。根据电阻率的关系确定的半绝缘样品的电活化能为1.0 eV。在所有三个样品中均观察到1.00和1.34 eV附近的LTPL谱线,标识为UD-1和UD-3缺陷,但在n型样品中UD-1谱线的强度几乎增加了10倍与p型样品相比,半绝缘样品介于这两者之间。 OAS和TSC实验证实了这种材料的高纯度。结果表明,主要的深能级与氮和硼杂质的相对浓度可以解释这种材料的电性能。

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